Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 11 (9) K89-K92 (2008)
Date:
2008-05-12

Author Information

Name Institution
Sung-Soo YimSeoul National University
Do-Joong LeeSeoul National University
Ki-Su KimSeoul National University
Moon-Sang LeeSeoul National University
Soo-Hyun KimYeungnam University
Ki-Bum KimSeoul National University

Films

Plasma Ru


Thermal Ru


Film/Plasma Properties

Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope

Substrates

SiO2

Notes

1191