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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 11 (9) K89-K92 (2008)
Date:
2008-05-12
Author Information
| Name | Institution |
|---|---|
| Sung-Soo Yim | Seoul National University |
| Do-Joong Lee | Seoul National University |
| Ki-Su Kim | Seoul National University |
| Moon-Sang Lee | Seoul National University |
| Soo-Hyun Kim | Yeungnam University |
| Ki-Bum Kim | Seoul National University |
Films
Plasma Ru
Thermal Ru
Film/Plasma Properties
Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope
Substrates
| SiO2 |
Keywords
| Nucleation |
Notes
| 1191 |