Publication Information

Title: Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application

Type: Journal

Info: Electrochemical and Solid-State Letters, 11 (9) K89-K92 (2008)

Date: 2008-05-12

DOI: http://dx.doi.org/10.1149/1.2952432

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Yeungnam University

Seoul National University

Films

Plasma Ru using ASM Genitech PEALD

Deposition Temperature = 300C

32992-96-4

7664-41-7

Thermal Ru using ASM Genitech PEALD

Deposition Temperature = 300C

32992-96-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Nucleation

TEM, Transmission Electron Microscope

JEOL JEM-3000F

Substrates

SiO2

Keywords

Nucleation

Notes

1191



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