Publication Information

Title:
Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 9 (10) G299-G301 (2006)
Date:
2006-06-01

Author Information

Name Institution
Sang-Hee Ko ParkElectronics and Telecommunication Research Institute, (ETRI)
Ho-Sang KwackElectronics and Telecommunication Research Institute, (ETRI)
Jin-Hong LeeElectronics and Telecommunication Research Institute, (ETRI)
Chi Sun HwangElectronics and Telecommunication Research Institute, (ETRI)
Hye-Yong ChuElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma ZnO


Thermal ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Substrates

Si(100)

Keywords

Plasma vs Thermal Comparison

Notes

1171