Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 9 (10) G299-G301 (2006)
Date:
2006-06-01
Author Information
| Name | Institution |
|---|---|
| Sang-Hee Ko Park | Electronics and Telecommunication Research Institute, (ETRI) |
| Ho-Sang Kwack | Electronics and Telecommunication Research Institute, (ETRI) |
| Jin-Hong Lee | Electronics and Telecommunication Research Institute, (ETRI) |
| Chi Sun Hwang | Electronics and Telecommunication Research Institute, (ETRI) |
| Hye-Yong Chu | Electronics and Telecommunication Research Institute, (ETRI) |
Films
Plasma ZnO
Thermal ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Substrates
| Si(100) |
Notes
| 1171 |