The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 50, No. 6, pp. 1827-1832
Date:
2006-09-12
Author Information
| Name | Institution |
|---|---|
| G. X. Liu | Dong-Eui University |
| F. K. Shan | Dong-Eui University |
| Won-Jae Lee | Dong-Eui University |
| B. C. Shin | Dong-Eui University |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Transmittance
Analysis: Spectrophotometry
Characteristic: Band Gap
Analysis: Spectrophotometry
Substrates
| Si(100) |
| Quartz |
Notes
| 1324 |