Publication Information

Title: Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas

Type: Journal

Info: Electrochemical and Solid-State Letters, 13 2 G13-G16 2010

Date: 2009-12-09

DOI: http://dx.doi.org/10.1149/1.3269901

Author Information

Name

Institution

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Seoul National University

Films

Deposition Temperature = 280C

546-68-9

10024-97-2

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Areal Density

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Substrates

Ru

Pt

Al2O3

Silicon

Keywords

Atomic Layer Deposition

Atom-surface Impact

Diffusion

Insulating Thin Films

Plasma Deposition

Semiconductor Growth

Semiconductor Materials

Semiconductor Thin Films

Titanium Compounds

Notes

31



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