Publication Information

Title:
Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 2 G13-G16 2010
Date:
2009-12-09

Author Information

Name Institution
Seok-Jun WonSeoul National University
Sungin SuhSeoul National University
Sang Woon LeeSeoul National University
Gyu-Jin ChoiSeoul National University
Cheol Seong HwangSeoul National University
Hyeong Joon KimSeoul National University

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Areal Density
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

Ru
Pt
Al2O3
Silicon

Keywords

Atomic Layer Deposition
Atom-surface Impact
Diffusion
Insulating Thin Films
Plasma Deposition
Semiconductor Growth
Semiconductor Materials
Semiconductor Thin Films
Titanium Compounds

Notes

31