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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 2 G13-G16 2010
Date:
2009-12-09
Author Information
| Name | Institution |
|---|---|
| Seok-Jun Won | Seoul National University |
| Sungin Suh | Seoul National University |
| Sang Woon Lee | Seoul National University |
| Gyu-Jin Choi | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
| Hyeong Joon Kim | Seoul National University |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Areal Density
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Substrates
| Ru |
| Pt |
| Al2O3 |
| Silicon |
Keywords
| Atomic Layer Deposition |
| Atom-surface Impact |
| Diffusion |
| Insulating Thin Films |
| Plasma Deposition |
| Semiconductor Growth |
| Semiconductor Materials |
| Semiconductor Thin Films |
| Titanium Compounds |
Notes
| 31 |