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2021 Year in Review




The publication database currently has 1628 entries.
Search from:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses

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Recent Database Additions
Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
Search 1628 plasma ALD publications by:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics

Hyeong Joon Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyeong Joon Kim returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
2Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
3Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
4Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
5Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
6Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
7The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films

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