Publication Information

Title:
Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 061503 (2017)
Date:
2017-07-31

Author Information

Name Institution
Tomomi SawadaNational Institute for Materials Science (NIMS)
Toshihide NabatameNational Institute for Materials Science (NIMS)
Thang Duy DaoNational Institute for Materials Science (NIMS)
Ippei YamamotoShibaura Institute of Technology
Kazunori KurishimaMeiji University
Takashi OnayaMeiji University
Akihiko OhiNational Institute for Materials Science (NIMS)
Kazuhiro ItoOsaka University
Makoto TakahashiOsaka University
Kazuyuki KohamaOsaka University
Tomoji OhishiShibaura Institute of Technology
Atsushi OguraMeiji University
Tadaaki NagaoNational Institute for Materials Science (NIMS)

Films

Plasma RuO2


Thermal Ru


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Leakage Current
Analysis: C-AFM, Conductive Atomic Force Microscopy

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

SiO2
Al2O3
TiO2

Keywords

Plasma vs Thermal Comparison

Notes

1089