Your search for plasma enhanced atomic layer deposition publications authored by Akihiko Ohi returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors|
|2||Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors|
|3||Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors|
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