Publication Information

Title: (Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors

Type: Journal

Info: ECS Transactions, 80 (1) 365-371 (2017)

Date: 2017-10-05

DOI: http://dx.doi.org/10.1149/08001.0365ecst

Author Information

Name

Institution

National Institute for Materials Science (NIMS)

Films

Plasma RuO2 using Unknown

Deposition Temperature = 300C

32992-96-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

TiO2

Keywords

Capacitors

Notes

1055



Shortcuts



© 2014-2019 plasma-ald.com