Publication Information

Title:
Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
Type:
Conference Proceedings
Info:
2015 China Semiconductor Technology International Conference (CSTIC) talk
Date:
2015-03-15

Author Information

Name Institution
Hao-Xiang ZhangHangzhou Silan Azure Co. Ltd.
Chun Min ZhangFudan University
Peng Fei WangFudan University

Films

Plasma RuO2


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Substrates

SiO2

Keywords

Notes

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