
Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
Type:
Conference Proceedings
Info:
2015 China Semiconductor Technology International Conference (CSTIC) talk
Date:
2015-03-15
Author Information
Name | Institution |
---|---|
Hao-Xiang Zhang | Hangzhou Silan Azure Co. Ltd. |
Chun Min Zhang | Fudan University |
Peng Fei Wang | Fudan University |
Films
Plasma RuO2
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Substrates
SiO2 |
Notes
530 |