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Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor

Type:
Journal
Info:
Coatings 2021, 11, 117
Date:
2021-01-15
DOI:
http://dx.doi.org/10.3390/coatings11020117

Author Information

Name Institution
Alexander E. RogozhinRussian Academy of Sciences
Andrey V. MiakonkikhRussian Academy of Sciences
Elizaveta SmirnovaRussian Academy of Sciences
Andrey LomovRussian Academy of Sciences
Sergey SimakinRussian Academy of Sciences
Konstantin V. RudenkoRussian Academy of Sciences

Films

Plasma Ru

Hardware used: Oxford Instruments FlexAL
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2
CAS#: 32992-96-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-400C

Plasma RuO2

Hardware used: Oxford Instruments FlexAL
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2
CAS#: 32992-96-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-400C

Plasma TaNx

Hardware used: Oxford Instruments FlexAL
TBTDET, tert-butylimido tris(diethylamino)tantalum, Ta[NEt2]3[=N-t-Bu)3]
CAS#: 169896-41-7
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 400C

Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Cascade Microtech Four-Point Probe

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000X

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Ultra 55

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Rigaku Smartlab

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Diagnostic: ION TOF TofSIMS 5

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Nanopics 2100

Characteristic: Stress
Analysis: Interferometry
Diagnostic: Zygo NewView 5000

Substrates

TaN
Si(100)
SiO2

Notes

1723