Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
Type:
Journal
Info:
Coatings 2021, 11, 117
Date:
2021-01-15
Author Information
| Name | Institution |
|---|---|
| Alexander E. Rogozhin | Russian Academy of Sciences |
| Andrey V. Miakonkikh | Russian Academy of Sciences |
| Elizaveta Smirnova | Russian Academy of Sciences |
| Andrey Lomov | Russian Academy of Sciences |
| Sergey Simakin | Russian Academy of Sciences |
| Konstantin V. Rudenko | Russian Academy of Sciences |
Films
Plasma Ru
Plasma RuO2
Plasma TaNx
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Stress
Analysis: Interferometry
Substrates
| TaN |
| Si(100) |
| SiO2 |
Notes
| 1723 |