Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Alexander E. Rogozhin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Alexander E. Rogozhin returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
2Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
3Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
4Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2