Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
Type:
Journal
Info:
Biosensors 2018, 8, 72
Date:
2018-07-28
Author Information
| Name | Institution |
|---|---|
| Kristina A Malsagova | Institute of Biomedical Chemistry |
| Tatyana O Pleshakova | Institute of Biomedical Chemistry |
| Andrey F Kozlov | Institute of Biomedical Chemistry |
| Ivan D Shumov | Institute of Biomedical Chemistry |
| Mikhail A. Ilnitskii | Russian Academy of Sciences |
| Andrey V. Miakonkikh | Moscow Institute of Physics and Technology |
| Vladimir P. Popov | Russian Academy of Sciences |
| Konstantin V. Rudenko | Russian Academy of Sciences |
| Alexander V. Glukhov | Novosibirsk Semiconductor Device Plant and Design Bureau |
| Igor N. Kupriyanov | Russian Academy of Sciences |
| Nina D. Ivanova | Skryabin Moscow State Academy of Veterinary Medicine and Biotechnology |
| Alexander E. Rogozhin | Moscow Institute of Physics and Technology |
| Alexander I. Archakov | Institute of Biomedical Chemistry |
| Yuri D. Ivanov | Institute of Biomedical Chemistry |
Films
Plasma HfO2
Plasma Al2O3
Film/Plasma Properties
Substrates
| Silicon |
Notes
| 1299 |