Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
Type:
Journal
Info:
Microsc. Microanal. 21 (Suppl 3), 2015
Date:
2015-09-23
Author Information
| Name | Institution |
|---|---|
| M. Kawasaki | JEOL USA Inc. |
| C.N. Hsiao | National Applied Research Laboratories |
| Jer-Ren Yang | National Taiwan University |
| Makoto Shiojiri | Kyoto Institute of Technology |
Films
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: STM, Scanning Tunneling Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Silicon |
| Amorphous C |
Notes
| 535 |