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Publication Information

Title: Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions

Type: Journal

Info: Microsc. Microanal. 21 (Suppl 3), 2015

Date: 2015-09-23

DOI: http://journals.cambridge.org/article_S1431927615010430

Author Information

Name

Institution

JEOL USA Inc.

National Applied Research Laboratories

National Taiwan University

Kyoto Institute of Technology

Films

Plasma Pt using Custom

Deposition Temperature Range = 200-300C

94442-22-5

7782-44-7

Plasma Ru using Custom

Deposition Temperature = 300C

32992-96-4

7782-44-7

Plasma Ru using Custom

Deposition Temperature = 300C

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Images

TEM, Transmission Electron Microscope

Unknown

Images

STM, Scanning Tunneling Microscopy

Unknown

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL JEM ARM 200

Substrates

Silicon

Amorphous C

Keywords

Notes

535


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