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Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions

Type:
Journal
Info:
Microsc. Microanal. 21 (Suppl 3), 2015
Date:
2015-09-23
DOI:
http://journals.cambridge.org/article_S1431927615010430

Author Information

Name Institution
M. KawasakiJEOL USA Inc.
C.N. HsiaoNational Applied Research Laboratories
Jer-Ren YangNational Taiwan University
Makoto ShiojiriKyoto Institute of Technology

Films

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-300C

Plasma Ru

Hardware used: Custom
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2
CAS#: 32992-96-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma Ru

Hardware used: Custom
(ethylbenzene) (1,3-cyclohexadiene) Ru(0), EBCHDRu
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Images
Analysis: STM, Scanning Tunneling Microscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL JEM ARM 200

Substrates

Silicon
Amorphous C

Notes

535