Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Journal of The Electrochemical Society, 155 (5) H296-H300 (2008)
Date:
2008-01-03
Author Information
| Name | Institution |
|---|---|
| Se-Hun Kwon | Korea Advanced Institute of Science and Technology |
| Oh-Kyum Kwon | Korea Advanced Institute of Science and Technology |
| Jin-Hyock Kim | Hynix Semiconductor |
| Heung-Ryong Oh | Korea Advanced Institute of Science and Technology |
| Kwang-Ho Kim | Pusan National University |
| Sang-Won Kang | Korea Advanced Institute of Science and Technology |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Nucleation
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| TiN |
Notes
| 1342 |