Publication Information

Title:
Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Journal of The Electrochemical Society, 155 (5) H296-H300 (2008)
Date:
2008-01-03

Author Information

Name Institution
Se-Hun KwonKorea Advanced Institute of Science and Technology
Oh-Kyum KwonKorea Advanced Institute of Science and Technology
Jin-Hyock KimHynix Semiconductor
Heung-Ryong OhKorea Advanced Institute of Science and Technology
Kwang-Ho KimPusan National University
Sang-Won KangKorea Advanced Institute of Science and Technology

Films

Plasma Ru


Film/Plasma Properties

Characteristic: Nucleation
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

TiN

Keywords

Notes

1342