Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 031502 (2016)
Date:
2016-02-16
Author Information
| Name | Institution |
|---|---|
| Inhye Lee | Hanyang University |
| Jingyu Park | Hanyang University |
| Heeyoung Jeon | Hanyang University |
| Hyunjung Kim | Hanyang University |
| Changhee Shin | Hanyang University |
| Seokyoon Shin | Hanyang University |
| Kunyoung Lee | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si(100) |
Notes
| 775 |