Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films

Type: Journal

Info: Electrochemical and Solid-State Letters, 7 (4) C46-C48 (2004)

Date: 2003-09-23

DOI: http://dx.doi.org/10.1149/1.1648612

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Films

Deposition Temperature = 270C

32992-96-4

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

SEM, Scanning Electron Microscopy

-

Resistivity, Sheet Resistance

Four-point Probe

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

TiN

Keywords

Adhesion

Notes

1238



Shortcuts



© 2014-2019 plasma-ald.com