Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films

Type: Journal

Info: Electrochemical and Solid-State Letters, 7 (4) C46-C48 (2004)

Date: 2003-09-23

DOI: http://dx.doi.org/10.1149/1.1648612

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Films

Deposition Temperature = 270C

32992-96-4

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

SEM, Scanning Electron Microscopy

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Substrates

TiN

Keywords

Adhesion

Notes

1238



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