Heon-Do Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Heon-Do Kim returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
2Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
3Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition


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