Your search for plasma enhanced atomic layer deposition publications authored by Heon-Do Kim returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films|
|2||Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films|
|3||Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition|
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