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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
  • Surface modification

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Heon-Do Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Heon-Do Kim returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
2Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
3Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
4Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition