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Publication Information

Title: Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films

Type: Journal

Info: Plasma Science and Technology, Vol.15, No.1, 2013

Date: 2012-01-04

DOI: http://dx.doi.org/10.1088/1009-0630/15/1/09

Author Information

Name

Institution

Lanzhou Institute of Physics

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Films

Plasma Al2O3 using Custom ECR

Deposition Temperature = 25C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Dektak

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG MKII

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Advance

Microstructure

TEM, Transmission Electron Microscope

JEOL 2010F

Interlayer

TEM, Transmission Electron Microscope

JEOL 2010F

Substrates

Silicon

Keywords

Notes

640

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