Publication Information

Title:
Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
Type:
Journal
Info:
Plasma Science and Technology, Vol.15, No.1, 2013
Date:
2012-01-04

Author Information

Name Institution
Yuqing XiongLanzhou Institute of Physics
Lijun SangBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication
Lizhen YangBeijing Institute of Graphic Communication
Zhengduo WangBeijing Institute of Graphic Communication
Zhongwei LiuBeijing Institute of Graphic Communication

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope

Substrates

Silicon

Keywords

Notes

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