
Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
Type:
Journal
Info:
Plasma Science and Technology, Vol.15, No.1, 2013
Date:
2012-01-04
Author Information
Name | Institution |
---|---|
Yuqing Xiong | Lanzhou Institute of Physics |
Lijun Sang | Beijing Institute of Graphic Communication |
Qiang Chen | Beijing Institute of Graphic Communication |
Lizhen Yang | Beijing Institute of Graphic Communication |
Zhengduo Wang | Beijing Institute of Graphic Communication |
Zhongwei Liu | Beijing Institute of Graphic Communication |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Substrates
Silicon |
Notes
640 |