Publication Information

Title:
Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 12 (4) H92-H94 (2009)
Date:
2008-12-08

Author Information

Name Institution
Honggyu KimHanyang University
Sanghyun WooHanyang University
Hyungchul KimHanyang University
Seokhwan BangHanyang University
Yongchan KimHanyang University
Daesik ChoiHanyang University
Hyeongtag JeonHanyang University

Films


Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Flat Band Voltage Shift
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Charge Retention Time
Analysis: C-t, Capacitance-time Measurements

Substrates

Si(100)
Pt

Keywords

Notes

755