Your search for plasma enhanced atomic layer deposition publications authored by Honggyu Kim returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures|
|2||Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer|
|3||Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition|
|4||Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices|
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