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2021 Year in Review




The publication database currently has 1628 entries.
Search from:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses

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Recent Database Additions
Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
Search 1628 plasma ALD publications by:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics

Honggyu Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Honggyu Kim returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
2Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
3Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
4Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
5Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
6The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD

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