Your search for plasma enhanced atomic layer deposition publications authored by Honggyu Kim returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures|
|2||Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer|
|3||Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments|
|4||Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition|
|5||Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices|
© 2014-2019 plasma-ald.com