2022 Year in Review

August 2023 Stats


The publication database currently has 1692 entries.
210 Films
283 Precursors
78 Dep Hardware Sets
255 Characteristics
94 Theses
5191 Authors

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2021 Year in Review
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Recent Database Additions
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier Self-limiting diamond growth from alternating CFx and H fluxes Sub-10-nm ferroelectric Gd-doped HfO2 layers

Honggyu Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Honggyu Kim returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
2Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
3Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
4Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
5Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
6The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD

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