Your search for plasma enhanced atomic layer deposition publications authored by Sanghyun Woo returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures|
|2||Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation|
|3||Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer|
|4||Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films|
|5||Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition|
|6||Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices|
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