Your search for plasma enhanced atomic layer deposition publications authored by Yongchan Kim returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films|
|2||Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition|
|3||Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices|
|4||The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD|
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