Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A117
Date:
2013-11-25
Author Information
| Name | Institution |
|---|---|
| Claudia Richter | NaMLab gGmbH |
| Tony Schenk | NaMLab gGmbH |
| Uwe Schroeder | NaMLab gGmbH |
| Thomas Mikolajick | NaMLab gGmbH |
Films
Thermal HfO2
Thermal HfO2
Plasma HfO2
Film/Plasma Properties
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Substrates
| TiN |
Notes
| Rapid thermal anneal |
| 9 |