Publication Information

Title:
Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A117
Date:
2013-11-25

Author Information

Name Institution
Claudia RichterNaMLab gGmbH
Tony SchenkNaMLab gGmbH
Uwe SchroederNaMLab gGmbH
Thomas MikolajickNaMLab gGmbH

Films




Film/Plasma Properties

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

TiN

Keywords

PEALD Film Development
High-k Dielectric Thin Films
Low-Temperature

Notes

Rapid thermal anneal
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