Publication Information

Title: Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors

Type: Conference Proceedings

Info: 2016 Joint IEEE International Symposium on the Applications of Ferroelectrics, European Conference on Application of Polar Dielectrics, and Piezoelectric Force Microscopy Workshop (ISAF/ECAPD/PFM)

Date: 2016-08-21

DOI: http://dx.doi.org/10.1109/ISAF.2016.7578103

Author Information

Name

Institution

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Films

Plasma HfO2 using Unknown

Deposition Temperature = 280C

352535-01-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Midgap Voltage

C-V, Capacitance-Voltage Measurements

-

Interface Trap Density

C-V, Capacitance-Voltage Measurements

-

Substrates

Silicon

Keywords

Radiation Hardness

Notes

973



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