The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
Type:
Journal
Info:
Facta universitatis - series: Electronics and Energetics 2014 Volume 27, Issue 4, Pages: 621-630
Date:
2014-07-21
Author Information
Name | Institution |
---|---|
Albena Paskaleva | Bulgarian Academy of Sciences |
Films
Plasma HfO2
Thermal HfO2
Film/Plasma Properties
Substrates
Notes
197 |