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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
Type:
Journal
Info:
Facta universitatis - series: Electronics and Energetics 2014 Volume 27, Issue 4, Pages: 621-630
Date:
2014-07-21
Author Information
| Name | Institution |
|---|---|
| Albena Paskaleva | Bulgarian Academy of Sciences |
Films
Plasma HfO2
Thermal HfO2
Film/Plasma Properties
Substrates
Keywords
Notes
| 197 |