Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures

Type:
Journal
Info:
Materials Research Bulletin 86 (2017) 302-307
Date:
2016-10-15
DOI:
https://doi.org/10.1016/j.materresbull.2016.10.032

Author Information

Name Institution
Ghada H. DushaqMasdar Institute of Science and Technology Abu Dhabi
Mahmoud S. RasrasMasdar Institute of Science and Technology Abu Dhabi
Ammar NayfehMasdar Institute of Science and Technology Abu Dhabi

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Plasma HfO2

Hardware used: Unknown
TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf
CAS#: 352535-01-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Silicon

Notes

926