Publication Information

Title:
Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
Type:
Journal
Info:
Advanced Materials Volume 26, Issue 17, pages 2755-2761, May 7, 2014
Date:
2014-01-28
DOI:
http://dx.doi.org/10.1002/adma.201304419

Author Information

Name Institution
Yichi ZhangUniversity of California - Santa Barbara (UCSB)

Films

Thermal Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, AlMe3, Trimethyl Aluminum
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 300C

Plasma HfO2

Hardware used: Oxford Instruments FlexAL
TEMAHf, (EtMeN)4Hf, [(C2H5)(CH3)N]4Hf, Tetrakis(EthylMethylAmido) Hafnium, Hafnium Ethylmethylamide
CAS#: 352535-01-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Keywords

Notes

214