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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
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Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
Type:
Journal
Info:
Advanced Materials Volume 26, Issue 17, pages 2755-2761, May 7, 2014
Date:
2014-01-28
Author Information
| Name | Institution |
|---|---|
| Yichi Zhang | University of California - Santa Barbara (UCSB) |
Films
Thermal Al2O3
Plasma HfO2
Film/Plasma Properties
Substrates
Notes
| 214 |