Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
Type:
Journal
Info:
APL Mater. 9, 031111 (2021)
Date:
2021-03-04
Author Information
Name | Institution |
---|---|
Takashi Onaya | Meiji University |
Toshihide Nabatame | National Institute for Materials Science (NIMS) |
Yong Chan Jung | University of Texas at Dallas |
Heber Hernandez-Arriaga | University of Texas at Dallas |
Jaidah Mohan | University of Texas at Dallas |
Harrison Sejoon Kim | University of Texas at Dallas |
Naomi Sawamoto | Meiji University |
Chang-Yong Nam | Brookhaven National Laboratory |
Esther H. R. Tsai | Brookhaven National Laboratory |
Takahiro Nagata | National Institute for Materials Science (NIMS) |
Jiyoung Kim | University of Texas at Dallas |
Atsushi Ogura | Meiji University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Ferroelectricity
Analysis: P-V, Polarization-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering
Substrates
TiN |
Notes
1687 |