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Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
Type:
Journal
Info:
Applied Physics Letters 91, 062910 (2007)
Date:
2007-07-16
Author Information
| Name | Institution |
|---|---|
| Ji-Hoon Ahn | Korea Advanced Institute of Science and Technology |
| Ja-Yong Kim | Korea Advanced Institute of Science and Technology |
| Sang-Won Kang | Korea Advanced Institute of Science and Technology |
| Jin-Hyock Kim | Hynix Semiconductor |
| Jae-Sung Roh | Hynix Semiconductor |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Ru |
| SrRuO |
Notes
| 1326 |