Publication Information

Title:
Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 211, Issue 2, pages 416-424, 2014
Date:
2013-09-19

Author Information

Name Institution
Van-Son DangRuhr-University Bochum
Harish ParalaRuhr-University Bochum
Jin Hyun KimRuhr-University Bochum
Ke XuRuhr-University Bochum
Nagendra B. SrinivasanRuhr-University Bochum
Eugen EdengeiserRuhr-University Bochum
Martina HavenithRuhr-University Bochum
Andreas D. WieckRuhr-University Bochum
Teresa de los ArcosRuhr-University Bochum
Roland A. FischerRuhr-University Bochum
Anjana DeviRuhr-University Bochum

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

Si(100)
Glass

Keywords

Notes

1379