Publication Information

Title:
Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
Surface & Coatings Technology 228, Supplement 1 (2013) S55 - S60
Date:
2012-08-27

Author Information

Name Institution
Xingcun LiBeijing Institute of Graphic Communication
Wenwen LeiBeijing Institute of Graphic Communication
Qiao ZhaoBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

Si(100)

Keywords

Notes

653