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Publication Information

Title: Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3

Type: Journal

Info: Surface & Coatings Technology 228, Supplement 1 (2013) S55 - S60

Date: 2012-08-27

DOI: http://dx.doi.org/10.1016/j.surfcoat.2012.08.041

Author Information

Name

Institution

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Beijing Institute of Graphic Communication

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon

Optical Properties

Ellipsometry

Horiba Jobin Yvon

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Hiden Analytical QMS

Substrates

Si(100)

Keywords

Notes

653


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