Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3

Type:
Journal
Info:
Surface & Coatings Technology 228, Supplement 1 (2013) S55 - S60
Date:
2012-08-27

Author Information

Name Institution
Xingcun LiBeijing Institute of Graphic Communication
Wenwen LeiBeijing Institute of Graphic Communication
Qiao ZhaoBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

Si(100)

Keywords

Notes

653