
Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
Type:
Journal
Info:
Surface & Coatings Technology 228, Supplement 1 (2013) S55 - S60
Date:
2012-08-27
Author Information
Name | Institution |
---|---|
Xingcun Li | Beijing Institute of Graphic Communication |
Wenwen Lei | Beijing Institute of Graphic Communication |
Qiao Zhao | Beijing Institute of Graphic Communication |
Qiang Chen | Beijing Institute of Graphic Communication |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Optical Properties
Analysis: Ellipsometry
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
Si(100) |
Notes
653 |