Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Wenwen Lei Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wenwen Lei returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
2Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
3Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic