Optical in situ monitoring of plasma-enhanced atomic layer deposition process

Type:
Journal
Info:
Japanese Journal of Applied Physics 57, 06JF05 (2018)
Date:
2018-02-13

Author Information

Name Institution
Muhammad Zeeshan ArshadMyongji University
Kyung Jae JoMyongji University
Hyun Gi KimMyongji University
Sang Jeen HongMyongji University

Films


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OPMS, Optical Plasma Monitoring System

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)

Substrates

PEN, Polyethylene Napthalate

Notes

1652