Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study

Type:
Journal
Info:
Applied Surface Science 483 (2019) 10 - 18
Date:
2019-03-19

Author Information

Name Institution
Alberto PerrottaGraz University of Technology
Julian PilzGraz University of Technology
Antonella MilellaUniversità degli studi di Bari
Anna Maria CocliteGraz University of Technology

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Band Gap
Analysis: Ellipsometry

Characteristic: Unknown
Analysis: Temperature Dependent Spectroscopic Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Unknown
Analysis: Temperature Dependent X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy

Substrates

Si(100)

Notes

1270