Publication Information

Title: Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study

Type: Journal

Info: Applied Surface Science 483 (2019) 10 - 18

Date: 2019-03-19

DOI: https://doi.org/10.1016/j.apsusc.2019.03.122

Author Information

Name

Institution

Graz University of Technology

Graz University of Technology

Università degli studi di Bari

Graz University of Technology

Films

Deposition Temperature Range = 25-250C

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000V

Refractive Index

Ellipsometry

J.A. Woollam M-2000V

Extinction Coefficient

Ellipsometry

J.A. Woollam M-2000V

Band Gap

Ellipsometry

J.A. Woollam M-2000V

Unknown

Temperature Dependent Spectroscopic Ellipsometry

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Empyrean

Unknown

Temperature Dependent X-Ray Diffraction

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

PHI VersaProbe 5000

Optical Absorption

UV-VIS Spectroscopy

-

Band Gap

UV-VIS Spectroscopy

-

Substrates

Si(100)

Keywords

Notes

1270



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