An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
Type:
Journal
Info:
J. Mater. Chem. C, 2016
Date:
2015-12-20
Author Information
| Name | Institution |
|---|---|
| Maximilian Gebhard | Ruhr-University Bochum |
| Felix Mitschker | Ruhr-University Bochum |
| M. Wiesing | University of Paderborn |
| I. Giner | University of Paderborn |
| B. Torun | University of Paderborn |
| Teresa de los Arcos | University of Paderborn |
| Peter Awakowicz | Ruhr-University Bochum |
| G. Grundmeier | University of Paderborn |
| Anjana Devi | Ruhr-University Bochum |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Diffusion Barrier Properties
Analysis: Oxygen Transmission Rate (OTR)
Characteristic: Precursor Characterization
Analysis: NMR, Nuclear Magnetic Resonance
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Refractive Index
Analysis: Reflectometry
Characteristic: Extinction Coefficient
Analysis: Reflectometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
| PET, Polyethylene Terephthalate |
Notes
| 471 |