Publication Information

Title: An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor

Type: Journal

Info: J. Mater. Chem. C, 2016

Date: 2015-12-20

DOI: http://dx.doi.org/10.1039/C5TC03385C

Author Information

Name

Institution

Ruhr-University Bochum

Ruhr-University Bochum

University of Paderborn

University of Paderborn

University of Paderborn

University of Paderborn

Ruhr-University Bochum

University of Paderborn

Ruhr-University Bochum

Films

Deposition Temperature = 60C

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

QCM, Quartz Crystal Microbalance

Inficon

Thickness

QCM, Quartz Crystal Microbalance

Inficon

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

JPK Nanowizard III Ultra

Diffusion Barrier Properties

Oxygen Transmission Rate (OTR)

Mocon OX-TRAN 2/61

Precursor Characterization

NMR, Nuclear Magnetic Resonance

Bruker Avance DPX 200

Precursor Characterization

TGA, Thermo Gravimetric Analysis

Seiko TG/DTA 6200/SII

Thickness

Reflectometry

Filmetrics

Refractive Index

Reflectometry

Filmetrics

Extinction Coefficient

Reflectometry

Filmetrics

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

NRA, Nuclear Reaction Analysis

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Omicron ESCA+

Substrates

Si(100)

PET, Polyethylene Terephthalate

Keywords

Diffusion Barrier

Notes

471



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