Publication Information

Title: An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor

Type: Journal

Info: J. Mater. Chem. C, 2016

Date: 2015-12-20

DOI: http://dx.doi.org/10.1039/C5TC03385C

Author Information

Name

Institution

Ruhr-University Bochum

Ruhr-University Bochum

University of Paderborn

University of Paderborn

University of Paderborn

University of Paderborn

Ruhr-University Bochum

University of Paderborn

Ruhr-University Bochum

Films

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

QCM, Quartz Crystal Microbalance

-

Thickness

QCM, Quartz Crystal Microbalance

-

Morphology, Roughness, Topography

Unknown

-

Diffusion Barrier Properties

Unknown

-

Substrates

Si(100)

PET, Polyethylene Terephthalate

Keywords

Diffusion Barrier

Notes

471



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