Publication Information

Title: An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor

Type: Journal

Info: J. Mater. Chem. C, 2016

Date: 2015-12-20

DOI: http://dx.doi.org/10.1039/C5TC03385C

Author Information

Name

Institution

Ruhr-University Bochum

Ruhr-University Bochum

University of Paderborn

University of Paderborn

University of Paderborn

University of Paderborn

Ruhr-University Bochum

University of Paderborn

Ruhr-University Bochum

Films

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

QCM, Quartz Crystal Microbalance

Unknown

Thickness

QCM, Quartz Crystal Microbalance

Unknown

Morphology, Roughness, Topography

Unknown

Unknown

Diffusion Barrier Properties

Unknown

Unknown

Substrates

Si(100)

PET, Polyethylene Terephthalate

Keywords

Diffusion Barrier

Notes

471



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