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Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A109 (2018)
Date:
2017-11-06
Author Information
| Name | Institution |
|---|---|
| Julian Pilz | Graz University of Technology |
| Alberto Perrotta | Graz University of Technology |
| Paul Christian | Graz University of Technology |
| Martin Tazreiter | Graz University of Technology |
| Roland Resel | Graz University of Technology |
| Günther Leising | Graz University of Technology |
| Thomas Griesser | University of Leoben |
| Anna Maria Coclite | Graz University of Technology |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Si(100) |
Notes
| 1413 |