Publication Information

Title:
Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Physics Letters 90, 222101 (2007)
Date:
2007-05-04

Author Information

Name Institution
Inhoe KimHanyang University
Seoungwoo KukHanyang University
Seokhoon KimHanyang University
Jinwoo KimHanyang University
Hyeongtag JeonHanyang University
Min Hyun ChoKorea Research Institute of Standards and Science (KRISS)
K.-B. ChungKorea Research Institute of Standards and Science (KRISS)

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: MEIS, Medium Energy Ion Scattering

Substrates

Si(100)

Keywords

Notes

1333