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Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Physics Letters 90, 222101 (2007)
Date:
2007-05-04
Author Information
| Name | Institution |
|---|---|
| Inhoe Kim | Hanyang University |
| Seoungwoo Kuk | Hanyang University |
| Seokhoon Kim | Hanyang University |
| Jinwoo Kim | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
| Min Hyun Cho | Korea Research Institute of Standards and Science (KRISS) |
| K.-B. Chung | Korea Research Institute of Standards and Science (KRISS) |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: MEIS, Medium Energy Ion Scattering
Substrates
| Si(100) |
Notes
| 1333 |