Publication Information

Title: Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition

Type: Journal

Info: Applied Physics Letters 90, 222101 (2007)

Date: 2007-05-04

DOI: http://dx.doi.org/10.1063/1.2743749

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Korea Research Institute of Standards and Science (KRISS)

Korea Research Institute of Standards and Science (KRISS)

Films

Deposition Temperature = 250C

19824-55-6

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

TEM, Transmission Electron Microscope

-

Images

TEM, Transmission Electron Microscope

-

Interfacial Layer

TEM, Transmission Electron Microscope

-

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

-

Chemical Composition, Impurities

MEIS, Medium Energy Ion Scattering

-

Substrates

Si(100)

Keywords

Notes

1333



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