The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
Type:
Conference Proceedings
Info:
Physics Procedia 18 (2011) 100–106
Date:
2011-08-07
Author Information
| Name | Institution |
|---|---|
| Xingcun Li | Beijing Institute of Graphic Communication |
| Qiang Chen | Beijing Institute of Graphic Communication |
| Lijun Sang | Beijing Institute of Graphic Communication |
| Lizhen Yang | Beijing Institute of Graphic Communication |
| Zhongwei Liu | Beijing Institute of Graphic Communication |
| Zhengduo Wang | Beijing Institute of Graphic Communication |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe
Characteristic: Ion Density
Analysis: Langmuir Probe
Substrates
| Si(100) |
Notes
| 1440 |