Publication Information

Title:
Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
Type:
Conference Proceedings
Info:
Physics Procedia 18 (2011) 100–106
Date:
2011-08-07

Author Information

Name Institution
Xingcun LiBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication
Lijun SangBeijing Institute of Graphic Communication
Lizhen YangBeijing Institute of Graphic Communication
Zhongwei LiuBeijing Institute of Graphic Communication
Zhengduo WangBeijing Institute of Graphic Communication

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe

Characteristic: Ion Density
Analysis: Langmuir Probe

Substrates

Si(100)

Keywords

Notes

1440