Title: Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
Type: Journal
Info: Plasma Chemistry and Plasma Processing 2015 pp 1-13
Date: 2015-10-20
DOI: http://dx.doi.org/10.1007/s11090-015-9677-y
Name
Institution
Korea Institute of Machinery and Materials
Korea Institute of Machinery and Materials
Korea Institute of Machinery and Materials
Korea Institute of Machinery and Materials
Korea Institute of Machinery and Materials
Korea Advanced Institute of Science and Technology
Korea Advanced Institute of Science and Technology
Characteristic
Analysis
Diagnostic
Thickness
Unknown
-
Plasma Species
OES, Optical Emission Spectroscopy
-
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
-
Silicon
493
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