Publication Information

Title: Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Plasma Chemistry and Plasma Processing 2015 pp 1-13

Date: 2015-10-20

DOI: http://dx.doi.org/10.1007/s11090-015-9677-y

Author Information

Name

Institution

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Plasma Species

OES, Optical Emission Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Silicon

Keywords

Notes

493



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