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Publication Information
Title:
Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Plasma Chemistry and Plasma Processing 2015 pp 1-13
Date:
2015-10-20
Author Information
Name | Institution |
---|---|
M. Hur | Korea Institute of Machinery and Materials |
D. J. Kim | Korea Institute of Machinery and Materials |
W. S. Kang | Korea Institute of Machinery and Materials |
J. O. Lee | Korea Institute of Machinery and Materials |
Y.-H. Song | Korea Institute of Machinery and Materials |
S. J. Kim | Korea Advanced Institute of Science and Technology |
I. D. Kim | Korea Advanced Institute of Science and Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: -
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Silicon |
Keywords
Notes
493 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |