Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 040901 (2019)
Date:
2019-05-23
DOI:
http://dx.doi.org/10.1116/1.5093402

Author Information

Name Institution
Fatemeh S. M. HashemiDelft University of Technology
LiAo CaoGhent University
Felix MattelaerGhent University
Timo SajavaaraUniversity of Jyväskylä
J. Ruud van OmmenDelft University of Technology
Christophe DetavernierGhent University

Films

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
aluminum isopropoxide, Al(O-i-Pr)3
CAS#: 555-31-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 140-300C

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
aluminum isopropoxide, Al(O-i-Pr)3
CAS#: 555-31-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 140-300C

Thermal Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
aluminum isopropoxide, Al(O-i-Pr)3
CAS#: 555-31-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 140-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Advance

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Advance

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Compositional Depth Profiling
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: Custom

Substrates

Si(100)

Notes

1558