Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


aluminum isopropoxide, Al(O-i-Pr)3, CAS# 555-31-7

Where to buy

NumberVendorRegionLink
1American Elements🇺🇸Aluminum Isopropoxide
2Strem Chemicals, Inc.🇺🇸Aluminum i-propoxide (99.99+%-Al) PURATREM
3Santa Cruz Biotechnology🇺🇸Aluminum isopropoxide
4Gelest🇺🇸ALUMINUM ISOPROPOXIDE
5Apollo Scientific🇬🇧Aluminium(III) isopropoxide
6TCI🇺🇸Aluminum Isopropoxide
7Sigma-Aldrich, Co. LLC🇺🇸 Aluminum isopropoxide >=98%
8Pegasus Chemicals🇬🇧Aluminium isopropoxide
9Alfa Aesar🇺🇸Aluminum isopropoxide, 98+%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films