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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
aluminum isopropoxide, Al(O-i-Pr)3, CAS# 555-31-7
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | American Elements | 🇺🇸 | Aluminum Isopropoxide |
| 2 | Strem Chemicals, Inc. | 🇺🇸 | Aluminum i-propoxide (99.99+%-Al) PURATREM |
| 3 | Alfa Aesar | 🇺🇸 | Aluminum isopropoxide, 98+% |
| 4 | TCI | 🇺🇸 | Aluminum Isopropoxide |
| 5 | Sigma-Aldrich, Co. LLC | 🇺🇸 | Aluminum isopropoxide >=98% |
| 6 | Santa Cruz Biotechnology | 🇺🇸 | Aluminum isopropoxide |
| 7 | Gelest | 🇺🇸 | ALUMINUM ISOPROPOXIDE |
| 8 | Apollo Scientific | 🇬🇧 | Aluminium(III) isopropoxide |
| 9 | Pegasus Chemicals | 🇬🇧 | Aluminium isopropoxide |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films |