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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
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Fatemeh S. M. Hashemi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fatemeh S. M. Hashemi returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films