Publication Information

Title:
A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 022417 (2020)
Date:
2020-01-29

Author Information

Name Institution
LiAo CaoGhent University
Felix MattelaerGhent University
Timo SajavaaraUniversity of Jyväskylä
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films

Thermal Al2O3


Plasma Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Substrates

Si(100)

Keywords

Notes

1450