A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 022417 (2020)
Date:
2020-01-29
DOI:
http://dx.doi.org/10.1116/1.5139631

Author Information

Name Institution
LiAo CaoGhent University
Felix MattelaerGhent University
Timo SajavaaraUniversity of Jyväskylä
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films

Thermal Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide
CAS#: 2269-22-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 100-300C

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide
CAS#: 2269-22-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-300C

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide
CAS#: 2269-22-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 100-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Substrates

Si(100)

Notes

1450