Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide CAS# 2269-22-9

ATSB, Al(OsBu)3, Al(OCHMeEt)3, Al[OCH(CH3)C2H5]3, Aluminum tri-sec-butoxide CAS# 2269-22-9 is available from the following source(s):

NumberVendorRegionLink
1Alfa Aesar🇺🇸Aluminum sec-butoxide, 97%
2TCI🇺🇸Aluminum sec-Butoxide
3Strem Chemicals, Inc.🇺🇸Aluminum s-butoxide, 98%
4American Elements🇺🇸Aluminum tri-sec-butoxide
5Sigma-Aldrich, Co. LLC🇺🇸Aluminum-tri-sec-butoxide

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