Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 041506 (2016)
Date:
2016-05-16

Author Information

Name Institution
Mikael BroasAalto University
Perttu SippolaAalto University
Timo SajavaaraUniversity of Jyväskylä
Vesa VuorinenAalto University
Alexander Pyymaki PerrosAalto University
Harri LipsanenAalto University
Mervi Paulasto-KröckelAalto University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Hydrogen Desorption
Analysis: TDS, Thermal Desorption Spectroscopy

Substrates

Si(100)

Keywords

Notes

792