Publication Information

Title: Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 041506 (2016)

Date: 2016-05-16

DOI: http://dx.doi.org/10.1116/1.4953029

Author Information

Name

Institution

Aalto University

Aalto University

University of Jyväskylä

Aalto University

Aalto University

Aalto University

Aalto University

Films

Plasma AlN using Picosun R200

Deposition Temperature = 200C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Plasmos SD 2300

Refractive Index

Ellipsometry

Plasmos SD 2300

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MPD X-ray Diffractometer

Microstructure

TEM, Transmission Electron Microscope

FEI Titan G2

Microstructure

TEM, Transmission Electron Microscope

FEI Technai F20

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

-

Hydrogen Desorption

TDS, Thermal Desorption Spectroscopy

-

Substrates

Si(100)

Keywords

Notes

792



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