Publication Information

Title:
Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Technical Physics Letters, 2017, Vol. 43, No. 1, pp. 74-77.
Date:
2016-07-12

Author Information

Name Institution
V. A. TaralaNorth-Caucasus Federal University
A. S. AltakhovNorth-Caucasus Federal University
M. AmbartsumovNorth-Caucasus Federal University
V. Ya. MartensNorth-Caucasus Federal University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Sapphire

Keywords

Notes

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