Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact

Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 138, 2015, Pages 22 - 25
Date:
2015-02-23
DOI:
http://dx.doi.org/10.1016/j.solmat.2015.02.030

Author Information

Name Institution
James BullockThe Australian National University
Andres CuevasThe Australian National University
Christian SamundsettThe Australian National University
Di YanThe Australian National University
Josephine McKeonThe Australian National University
Yimao WanThe Australian National University

Films

Plasma Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 175C

Film/Plasma Properties

Substrates

Notes

385