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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 138, 2015, Pages 22 - 25
Date:
2015-02-23
Author Information
| Name | Institution |
|---|---|
| James Bullock | The Australian National University |
| Andres Cuevas | The Australian National University |
| Christian Samundsett | The Australian National University |
| Di Yan | The Australian National University |
| Josephine McKeon | The Australian National University |
| Yimao Wan | The Australian National University |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 385 |