Plasma-Modified Atomic Layer Deposition
Type:
Conference Proceedings
Info:
68th Annual Gaseous Electronics Conference
Date:
2015-10-13
Author Information
| Name | Institution |
|---|---|
| Thomas Larrabee | U.S. Naval Research Laboratory |
| Sharka M. Prokes | U.S. Naval Research Laboratory |
Films
Other ZnO
Hardware used: Beneq TFS-200
Other VOx
Hardware used: Beneq TFS-200
Other HfO2
Hardware used: Beneq TFS-200
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Plasmon Resonances
Analysis: -
Characteristic: Electron Paramagnetic Resonance
Analysis: -
Characteristic: Optical Dispersion
Analysis: -
Characteristic: Mobility
Analysis: -
Characteristic: Carrier Concentration
Analysis: -
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Substrates
Notes
| 520 |