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Publication Information

Title: Plasma-Modified Atomic Layer Deposition

Type: Conference Proceedings

Info: 68th Annual Gaseous Electronics Conference

Date: 2015-10-13

DOI: http://meetings.aps.org/link/BAPS.2015.GEC.GT1.165

Author Information

Name

Institution

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

Films

Other ZnO using Beneq TFS-200

Deposition Temperature Range N/A

Other VOx using Beneq TFS-200

Deposition Temperature Range N/A

Other HfO2 using Beneq TFS-200

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Unknown

Plasmon Resonances

Unknown

Unknown

Electron Paramagnetic Resonance

Unknown

Unknown

Optical Dispersion

Unknown

Unknown

Mobility

Unknown

Unknown

Carrier Concentration

Unknown

Unknown

Resistivity, Sheet Resistance

Unknown

Unknown

Substrates

Keywords

Notes

520


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