Publication Information

Title:
Plasma-Modified Atomic Layer Deposition
Type:
Conference Proceedings
Info:
68th Annual Gaseous Electronics Conference
Date:
2015-10-13

Author Information

Name Institution
Thomas LarrabeeU.S. Naval Research Laboratory
Sharka M. ProkesU.S. Naval Research Laboratory

Films

Other ZnO

Hardware used: Beneq TFS-200


Other VOx

Hardware used: Beneq TFS-200


Other HfO2

Hardware used: Beneq TFS-200


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -

Characteristic: Plasmon Resonances
Analysis: -

Characteristic: Electron Paramagnetic Resonance
Analysis: -

Characteristic: Optical Dispersion
Analysis: -

Characteristic: Mobility
Analysis: -

Characteristic: Carrier Concentration
Analysis: -

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Substrates

Keywords

Notes

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