Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating

Type:
Journal
Info:
Micromachines 2021, 12, 588
Date:
2021-05-19

Author Information

Name Institution
William ChiappimInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Giorgio E. TestoniInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Felipe MirandaInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Mariana A. FragaUniversidade Federal de São Paulo
Humber FurlanCentro Estadual de Educação Tecnológica Paula Souza
David Ardiles SaraviaGrenoble Alps University (UGA)
Argemiro da Silva SobrinhoInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Gilberto PetraconiInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Homero S. MacielInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Rodrigo S. PessoaInstituto Tecnológico de Aeronáutica (ITA-DCTA)

Films



Plasma Al2O3


Thermal Al2O3


Plasma TiO2


Thermal TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Hardness
Analysis: Nanoindentation

Characteristic: Young's Modulus
Analysis: Nanoindentation

Characteristic: Elastic Modulus
Analysis: Nanoindentation

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy

Characteristic: Band Gap
Analysis: Ellipsometry

Substrates

Si(100)
soda lime glass

Keywords

Plasma vs Thermal Comparison

Notes

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