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Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating

Type:
Journal
Info:
Micromachines 2021, 12, 588
Date:
2021-05-19
DOI:
http://dx.doi.org/10.3390/mi12060588

Author Information

Name Institution
William ChiappimInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Giorgio E. TestoniInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Felipe MirandaInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Mariana A. FragaUniversidade Federal de São Paulo
Humber FurlanCentro Estadual de Educação Tecnológica Paula Souza
David Ardiles SaraviaGrenoble Alps University (UGA)
Argemiro da Silva SobrinhoInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Gilberto PetraconiInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Homero S. MacielInstituto Tecnológico de Aeronáutica (ITA-DCTA)
Rodrigo S. PessoaInstituto Tecnológico de Aeronáutica (ITA-DCTA)

Films

Plasma AlTixOy

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Thermal AlTixOy

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 250C

Plasma Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Thermal Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 250C

Plasma TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Thermal TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Hardness
Analysis: Nanoindentation
Diagnostic: Future Tech FM-700

Characteristic: Young's Modulus
Analysis: Nanoindentation
Diagnostic: Future Tech FM-700

Characteristic: Elastic Modulus
Analysis: Nanoindentation
Diagnostic: Future Tech FM-700

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: Horiba LabRam Evolution

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Shimadzu SPM9500

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: JASCO V-570

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Diagnostic: JASCO V-570

Characteristic: Band Gap
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Substrates

Si(100)
soda lime glass

Notes

1625