Title: Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
Type: Journal
Info: Japanese Journal of Applied Physics 54, 08KD21 (2015)
Date: 2015-05-19
DOI: http://dx.doi.org/10.7567/JJAP.54.08KD21
Name
Institution
Université Lille 1
Université Lille 1
Université Lille 1
Photowatt
Photowatt
Characteristic
Analysis
Diagnostic
Interface Trap Density
C-V, Capacitance-Voltage Measurements
Unknown
Flat Band Voltage
C-V, Capacitance-Voltage Measurements
Unknown
Effective Charge Density
C-V, Capacitance-Voltage Measurements
Unknown
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Bruker Dimension ICON
Chemical Composition, Impurities
SIMS, Secondary Ion Mass Spectrometry
Unknown
Photoconductance
Photoconductance
Sinton WCT-120 Lifetime Tester
Silicon
364
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